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NewsEvents&ExhibitionsMikcell attends the 25th European Mask and Lithography Conference EMLC 2009January 2009 Dresden, Germany Semicon Europe 2008, Stuttgart Tu 7th - Th 9th October 2008 Booth #945 One-on-One Forum, Munich Germany Innovation in Microsystems We 5th March 2008 Semicon China 2008, Shanghai International Expo Centre Tu 18th - Th 20th March 2008 |
Mikcell invests in new high resolution production lineDWL 1100 maskless lithography system is capable of exposing photomasks of up to 1.1m x 1.1m, with features down to 1 micron. Among other things, it's equipped with a semi automatic handling system, online data transfer, metrology and alignment system. "Thanks to our investment in DWL 1100 Laser Lithography System from Heidelberger Instruments, we will be able to start large-scale production and increase our market share. This will significantly strengthen our position in the international markets" says Elina Ruohonen-Braun, Managing Director. "The system will be used in different kind of applications such as MEMS, advanced electronic packaging in the semiconductor and telecommunication industry, LCD and IC circuit production process". Mikcell Oy is an ISO 9001:2000 certified photomask company operating in the Oulu region in Finland. Mikcell works in cooperation with multinational semiconductor groups, providing them with its know-how in photolithographic applications. 
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