News Mikcell invests in new high resolution production line Events&Exhibitions: Semicon Europe 2008, Stuttgart Tu 7th - Th 9th October 2008 Booth #945 One-on-One Forum, Munich Germany Innovation in Microsystems We 5th March 2008 Semicon China 2008, Shanghai International Expo Centre Tu 18th - Th 20th March 2008 Additional information: Mask process flow Our aim is to be your partner to develop complex microlithografic products based on your requirement. We have competence in the design process and are used to work in close co-operation with the customer to reach the best performance at the lowest cost and the fastest turn-around. Designs can be sent by high speed data links (e-mail, FTP) to our production for further handling. This enables us the fastest turn-around and in many cases Next Day delivery is possible. Technical specification Input formats: GDS II, and others like AutoCAD (DXF, DWG) and Gerber Min line 1,0 µm +- 130nm Substrate: Sodalime/ Quartz Mask size 4" up to 44" x 44" Material Sodalime / Quarts Delivery times: 24h up to few days			MIKCELL PHOTOMASKS ARE USED FOR: EL displays Plasma displays LCD displays Color filters Shadow Masks Electroforming Printed Circuit Boards Multi Chip Modules Electronic packaging Calibration plates Gratings Hologram plates Photonic devices Micromechanical devices Superconductive devices Microstrip detectors