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Products & Services
NewsEvents&ExhibitionsMikcell attends the 25th European Mask and Lithography Conference EMLC 2009January 2009 Dresden, Germany Semicon Europe 2008, Stuttgart Tu 7th - Th 9th October 2008 Booth #945 One-on-One Forum, Munich Germany Innovation in Microsystems We 5th March 2008 Semicon China 2008, Shanghai International Expo Centre Tu 18th - Th 20th March 2008 Additional information:Mask process flow |
Our aim is to be your partner to develop complex microlithographic
products based on your requirement. We have competence
in the design process and are used to work in close co-operation
with the customer to reach the best performance at the lowest cost
and the fastest turn-around. Designs can be sent by high speed data links (e-mail, FTP) to our production for further handling. This enables us the fastest turn-around and in many cases Next Day delivery is possible. Technical specification
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MIKCELL PHOTOMASKS ARE USED FOR: EL displays Plasma displays LCD displays Color filters Shadow Masks Electroforming Printed Circuit Boards Multi Chip Modules Electronic packaging Calibration plates Gratings Hologram plates Photonic devices Micromechanical devices Superconductive devices Microstrip detectors |